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Proceedings Paper

Critical enabling properties of CaF2 lens blanks for state-of-the-art lithography tools
Author(s): Joerg Hahn; Guenter Grabosch; Lutz Parthier; Konrad Knapp
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Paper Abstract

F2 lens designs considering Intrinsic birefringence imposed more severe challenges to CaF2 manufacturing technology. In order to compensate the intrinsic birefringence other crystal orientations (100) / (110) are necessary. These other crystal orientation beside (111) require individual process optimization. In this paper the achieved improvements for CaF2 lens blank material will be presented. Furthermore the conversion of stress birefringence results from 633nm to 193nm or 157nm is unclear until now. At wavelength birefringence measurement results of different orientated lens blanks will be shown and discussed.

Paper Details

Date Published: 26 June 2003
PDF: 8 pages
Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); doi: 10.1117/12.485417
Show Author Affiliations
Joerg Hahn, Schott Lithotec AG (Germany)
Guenter Grabosch, Schott Lithotec AG (Germany)
Lutz Parthier, Schott Lithotec AG (Germany)
Konrad Knapp, Schott Lithotec AG (Germany)


Published in SPIE Proceedings Vol. 5040:
Optical Microlithography XVI
Anthony Yen, Editor(s)

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