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Proceedings Paper

Hybrid PPC methodology using multi-step correction and implementation for the sub-100-nm node
Author(s): Soo-Han Choi; Ji-Soong Park; Chul-Hong Park; Won-Young Chung; In-sung Kim; Dong-Hyun Kim; Yoo-Hyon Kim; Moon-Hyun Yoo; Jeong-Taek Kong
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Paper Abstract

As semiconductor devices are scaled down to the sub-100nm node, the fine control of ACLV (across-chip line-width variation) to improve the performance of chips and the expansion of the process window to enhance yield are required. One of the techniques reducing ACLV is MPPC (model-based process proximity correction). However, it increases pattern complexity and does not guarantee enough process windows. Therefore, we propose a HPPC (hybrid PPC) methodology combining RPPC (rule-based PPC) and MPPC, which correct the gate on active by MPPC for device performance and the field gate by RPPC for process window. In addition, we optimize SRAF (sub-resolution assist feature) design to improve process windows further at the full chip level and apply the multi-step correction, which corrects optical and etch proximity effects separately to minimize ACLV. As the result of the application to the 90nm logic gate, we achieve over 0.3um DOF (depth of focus) and the line-width variation within ±5% of the target CD (critical dimension).

Paper Details

Date Published: 26 June 2003
PDF: 8 pages
Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); doi: 10.1117/12.485397
Show Author Affiliations
Soo-Han Choi, Samsung Electronics Co., Ltd. (South Korea)
Ji-Soong Park, Samsung Electronics Co., Ltd. (South Korea)
Chul-Hong Park, Samsung Electronics Co., Ltd. (South Korea)
Won-Young Chung, Samsung Electronics Co., Ltd. (South Korea)
In-sung Kim, Samsung Electronics Co., Ltd. (South Korea)
Dong-Hyun Kim, Samsung Electronics Co., Ltd. (South Korea)
Yoo-Hyon Kim, Samsung Electronics Co., Ltd. (South Korea)
Moon-Hyun Yoo, Samsung Electronics Co., Ltd. (South Korea)
Jeong-Taek Kong, Samsung Electronics Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 5040:
Optical Microlithography XVI
Anthony Yen, Editor(s)

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