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Proceedings Paper

Ultra line-narrowed ArF excimer laser G42A for sub-90-nm lithography generation
Author(s): Takashi Saito; Toru Suzuki; Masaya Yoshino; Osamu Wakabayashi; Takashi Matsunaga; Junichi Fujimoto; Kouji Kakizaki; Taku Yamazaki; Toyoharu Inoue; Katsutomo Terashima; Tatsuo Enami; Hirotoshi Inoue; Akira Sumitani; Hitoshi Tomaru; Hakaru Mizoguchi
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Paper Abstract

193-nm lithography is going to move from pre-production phase to mass production phase and its target node become narrowing from 90 nm to 65 nm. In these situations, the laser manufacture needs to provide the high durable ArF excimer laser, which has superior spectrum performance. Gigaphoton has already introduced 4 kHz ArF laser (model G41A) to 193-nm lithography market, which produce 20 W and spectrum bandwidth of 0.35 pm (FWHM). G41A has showed high reliability and long lifetime over 5 billion pulses. In this paper, we report on the 4 kHz ArF excimer laser for mass production, model G42A, which has 20 W, spectral bandwidth less than 0.3 pm (FWHM) and a spectral purity less than 0.75 pm (E95).

Paper Details

Date Published: 26 June 2003
PDF: 8 pages
Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); doi: 10.1117/12.485386
Show Author Affiliations
Takashi Saito, Gigaphoton Inc. (Japan)
Toru Suzuki, Gigaphoton Inc. (Japan)
Masaya Yoshino, Gigaphoton Inc. (Japan)
Osamu Wakabayashi, Komatsu Ltd. (Japan)
Takashi Matsunaga, Gigaphoton Inc. (Japan)
Junichi Fujimoto, Gigaphoton Inc. (Japan)
Kouji Kakizaki, Gigaphoton Inc. (Japan)
Taku Yamazaki, Gigaphoton Inc. (Japan)
Toyoharu Inoue, Gigaphoton Inc. (Japan)
Katsutomo Terashima, Gigaphoton Inc. (Japan)
Tatsuo Enami, Gigaphoton Inc. (Japan)
Hirotoshi Inoue, Gigaphoton Inc. (Japan)
Akira Sumitani, Komatsu Ltd. (Japan)
Hitoshi Tomaru, Gigaphoton Inc. (Japan)
Hakaru Mizoguchi, Gigaphoton Inc. (Japan)

Published in SPIE Proceedings Vol. 5040:
Optical Microlithography XVI
Anthony Yen, Editor(s)

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