Share Email Print

Proceedings Paper

Spectral dynamics analysis of utlra-line-narrowed F2 laser
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

We have developed an ultra-line-narrowed, high-repetition-rate, high-power injection-locked F2 laser system for 157 nm dioptric projection systems under the ASET project “F2 Laser Lithography Development Project”. A spectral bandwidth of < 0.2 pm (FWHM), an output power of > 25 W, and an energy stability (3-sigma) of < 10 % at 5 kHz repetition rate was successfully obtained by using a low-power ultra-line-narrowed oscillator laser and a high-gain multi-pass amplifier laser. These parameters satisfy the requirements of exposure tools. A numerical simulation code that can simulate the spectral dynamics of the F2 laser under different operation modes such as free running operation, line-narrowed operation, and injection-locked operation, has also been developed. Using this simulation code, it is found that the instantaneous spectral bandwidth narrows monotonously during the laser pulse, and a narrower spectral output can be obtained by seeding the tail area of the line-narrowed F2 laser pulse. And the line-narrowing operation of the oscillator laser and the behavior of the injection-locked laser system can be predicted very precisely with this simulation code. The development of F2 laser for microlithography will be accelerated by this new simulation code.

Paper Details

Date Published: 26 June 2003
PDF: 8 pages
Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); doi: 10.1117/12.485381
Show Author Affiliations
Takahito Kumazaki, Komatsu Ltd. (Japan)
Osamu Wakabayashi, Komatsu Ltd. (Japan)
Ryoichi Nohdomi, Gigaphoton Inc. (Japan)
Tatsuya Ariga, Komatsu Ltd. (Japan)
Hidenori Watanabe, Gigaphoton Inc. (Japan)
Kazuaki Hotta, Ushio Inc. (Japan)
Hakaru Mizoguchi, Gigaphoton Inc. (Japan)
Hiroki Tanaka, Kyushu Univ. (Japan)
Akihiko Takahashi, Kyushu Univ. (Japan)
Tatsuo Okada, Kyushu Univ. (Japan)

Published in SPIE Proceedings Vol. 5040:
Optical Microlithography XVI
Anthony Yen, Editor(s)

© SPIE. Terms of Use
Back to Top