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Proceedings Paper

Low-proximity contact hole formation by using double-exposure technology (DET)
Author(s): Charles Chang; Elvis Yang; Tzong-Shane Wu; Ta-Hung Yang; Calvin C. Hsueh
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Paper Abstract

As semiconductor technologies move toward 0.18um and below, it is difficult to get high pattern fidelity by 248-nm wavelength exposure. To reduce proximity effect, a lot of resolution enhancement technologies (RET) such as OPC, assistant feature, and double exposure technologies (DET) have been introduced. In this paper, random contact holes with low proximity effect were delivered by using 248-nm exposure tool in conjunction with double exposure technology. A low proximity resist patterns were formed by a well-designed Pack-mask. Then ion implantation treatment produced a solvent proof skin on the developed resist. The second lithography process was performed over the post-implanted resist layer. Resist coating as well as exposure perfectly transfer the patterns from Cover-mask. After etch, random holes with low proximity effect were easily achieved. In addition, higher energy association with higher dosages is able to maintain good critical dimension even if wafers went through three rework processes.

Paper Details

Date Published: 26 June 2003
PDF: 6 pages
Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); doi: 10.1117/12.485365
Show Author Affiliations
Charles Chang, Macronix International Co., Ltd. (Taiwan)
Elvis Yang, Macronix International Co., Ltd. (Taiwan)
Tzong-Shane Wu, Macronix International Co., Ltd. (Taiwan)
Ta-Hung Yang, Macronix International Co., Ltd. (Taiwan)
Calvin C. Hsueh, Macronix International Co., Ltd. (Taiwan)

Published in SPIE Proceedings Vol. 5040:
Optical Microlithography XVI
Anthony Yen, Editor(s)

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