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Proceedings Paper

Comparison of vector theories for aerial image calculation
Author(s): Byoung Sup Ahn; Sonny Y. Zinn; Sung-Woon Choi; Jung-Min Sohn
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Paper Abstract

In simulation of optical lithography it is well known that for high-NA the coupling between the vector components of the electromagnetic wave cannot be ignored and a vector diffraction theory should be employed to calculate aerial images. Commercial programs produce the same aerial image for scalar diffraction theory. When vector models are selected, they give the consistent images in latest versions. However formula of vector models give the different mathematical formula. To understand the origin of the difference, we compared the vector models adopted by Refs.

Paper Details

Date Published: 26 June 2003
PDF: 7 pages
Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); doi: 10.1117/12.485354
Show Author Affiliations
Byoung Sup Ahn, Samsung Electronics Co., Ltd. (South Korea)
Sonny Y. Zinn, Samsung Electronics Co., Ltd. (South Korea)
Sung-Woon Choi, Samsung Electronics Co., Ltd. (South Korea)
Jung-Min Sohn, Samsung Electronics Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 5040:
Optical Microlithography XVI
Anthony Yen, Editor(s)

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