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Proceedings Paper

High-performance beam stabilization for next-generation ArF scanner systems
Author(s): Leonard Lublin; David Warkentin; Palash P. Das; Alexander I. Ershov; Jody Vipperman; Ronald L. Spangler; Brian Klene
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Paper Abstract

With the advent of 193 nm systems processing 300 mm wafers, the production lithography cell is about to undergo a technology shift. The mechanism for delivering the beam from the light source to the illumination system, here referred to as a Beam Delivery Unit (BDU), must change to meet the challenges imposed by this shift. To support these changes, Cymer is developing a BDU that will guarantee a stable beam at the scanner entrance during exposure. The beam stabilization control system has been implemented in a test BDU. We shall present results from experiments that demonstrate our ability to significantly improve short and long term “Beam Stability”.

Paper Details

Date Published: 26 June 2003
PDF: 12 pages
Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); doi: 10.1117/12.485351
Show Author Affiliations
Leonard Lublin, Cymer, Inc. (United States)
David Warkentin, Cymer, Inc. (United States)
Palash P. Das, Cymer, Inc. (United States)
Alexander I. Ershov, Cymer, Inc. (United States)
Jody Vipperman, Cymer, Inc. (United States)
Ronald L. Spangler, Cymer, Inc. (United States)
Brian Klene, Cymer, Inc. (United States)


Published in SPIE Proceedings Vol. 5040:
Optical Microlithography XVI
Anthony Yen, Editor(s)

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