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Proceedings Paper

193-nm detector nonlinearity measurement system at NIST
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Paper Abstract

To meet the semiconductor industry’s demands for accurate measurements on excimer lasers, we have developed a system using the correlation method to measure the nonlinear response of pulse energy detectors of excimer laser at 193 nm. The response of the detector under test to incident laser pulse energy is compared to the corresponding response of a linear monitor detector. This method solves the difficulties caused by large pulse-to-pulse instability of the excimer laser and delivers measurement results with an expanded uncertainty (k=2) of 0.8 %.

Paper Details

Date Published: 26 June 2003
PDF: 6 pages
Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); doi: 10.1117/12.485343
Show Author Affiliations
Shao Yang, National Institute of Standards and Technology (United States)
Darryl A. Keenan, National Institute of Standards and Technology (United States)
Holger Laabs, National Institute of Standards and Technology (United States)
Marla L. Dowell, National Institute of Standards and Technology (United States)


Published in SPIE Proceedings Vol. 5040:
Optical Microlithography XVI
Anthony Yen, Editor(s)

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