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Proceedings Paper

Sol-gel fabrication of high-quality photomask substrates
Author(s): Rahul Ganguli; D. Laurence Meixner; Steve G. Colbern; Matt S. Gleason; Douglas E. Meyers; Satyabrata Ray Chaudhuri
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Paper Abstract

Synthetic silica photomask substrates are currently manufactured by cutting, grinding, and polishing glass boules prepared using a flame hydrolysis process. YTC America is developing an alternative technique, based on sol-gel processing, to fabricate high quality substrates. This new technology allows near net shape fabrication of synthetic silica monoliths, thus eliminating the need for cutting and grinding. The complex relationship between glass properties and process parameters in the formulation, drying, and sintering steps has been determined, and a repeatable process has been established. These substrates meet all SEMI specifications for ULTE hard surface photomask substrates for 248-nm lithography. The technology may also be extended to 193-nm and 157-nm photomask substrates. This sol-gel-based process may represent a unique and cost-effective alternative for manufacturing photomask substrates for deep UV lithography.

Paper Details

Date Published: 26 June 2003
PDF: 8 pages
Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); doi: 10.1117/12.485341
Show Author Affiliations
Rahul Ganguli, YTC America Inc. (United States)
D. Laurence Meixner, YTC America Inc. (United States)
Steve G. Colbern, YTC America Inc. (United States)
Matt S. Gleason, YTC America Inc. (United States)
Douglas E. Meyers, YTC America Inc. (United States)
Satyabrata Ray Chaudhuri, YTC America Inc. (United States)


Published in SPIE Proceedings Vol. 5040:
Optical Microlithography XVI
Anthony Yen, Editor(s)

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