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Proceedings Paper

Optimizing and enhancing optical systems to meet the low k1 challenge
Author(s): Donis G. Flagello; Robert John Socha; Xuelong Shi; Jan B.P. van Schoot; Jan Baselmans; Mark A. van de Kerkhof; Wim de Boeij; Andre Engelen; Rene Carpaij; Oscar Noordman; Marco H. P. Moers; Melchior Mulder; Jo Finders; Henk van Greevenbroek; Martin Schriever; Manfred Maul; Helmut Haidner; Markus Goeppert; Ulrich Wegmann; Paul Graeupner
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Paper Abstract

Current roadmaps show that the semiconductor industry continues to drive the usable Rayleigh resolution towards the fundamental limit (for 50% duty cycle lines) at k1=0.25. This is being accomplished through use of various resolution enhancement technologies (RETs), extremely low aberration optics with stable platforms, and resists processes that have ever-increasing dissolution contrast and smaller diffusion lengths. This talk will give an overview of the latest optical mechanisms that can be used to improve the imaging system for low k1 resolutions. We show 3 non-photoresist techniques to measure the optical parameters of a scanner: 1) a new fast phase measurement interferometer to measure aberrations is presented with an accuracy and repeatability of <3mλ, 2) we introduce a method to measure the illumination profile of the exposing source, and 3) a measurement system to monitor scattered light is presented with correlation to other techniques using a salted pellicle experiment to create controlled scattered light. The optimization of illumination and exposure dose is presented. We show the mechanism for customizing illumination based on specific mask layers. We show how this is done and compare process windows to other more conventional modes such as annular illumination or QUASAR. The optimum design is then implemented into hardware that can give extremely high optical efficiency. We also show how system level control mechanisms can be used to field-to-field and across-field exposure to compensate for lithography errors. Examples of these errors can include reticle CD deviations, wavefront aberrations, and across-field illumination uniformity errors. CD maps, facilitated by SEM and ELM, can give the prescribed changes necessary. We present a system that interfaces to new hardware to compensate these effects by active scanner corrections.

Paper Details

Date Published: 26 June 2003
PDF: 12 pages
Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); doi: 10.1117/12.485340
Show Author Affiliations
Donis G. Flagello, ASML (United States)
Robert John Socha, ASML (United States)
Xuelong Shi, ASML (United States)
Jan B.P. van Schoot, ASML (Netherlands)
Jan Baselmans, ASML (Netherlands)
Mark A. van de Kerkhof, ASML (Netherlands)
Wim de Boeij, ASML (Netherlands)
Andre Engelen, ASML (Netherlands)
Rene Carpaij, ASML (Netherlands)
Oscar Noordman, ASML (Netherlands)
Marco H. P. Moers, ASML (Netherlands)
Melchior Mulder, ASML (Netherlands)
Jo Finders, ASML (Netherlands)
Henk van Greevenbroek, ASML (Netherlands)
Martin Schriever, Carl Zeiss SMT AG (Germany)
Manfred Maul, Carl Zeiss SMT AG (Germany)
Helmut Haidner, Carl Zeiss SMT AG (Germany)
Markus Goeppert, Carl Zeiss SMT AG (Germany)
Ulrich Wegmann, Carl Zeiss SMT AG (Germany)
Paul Graeupner, Carl Zeiss SMT AG (Germany)


Published in SPIE Proceedings Vol. 5040:
Optical Microlithography XVI
Anthony Yen, Editor(s)

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