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Proceedings Paper

Exposure-focus critical dimension feedback control in 300-mm manufacturing technologies
Author(s): Anju Narendra; Steven L. Carson; Cynthia Morrison
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Paper Abstract

Control of DCCDs (Develop Check Critical Dimension) is a key aspect of successfully manufacturing semiconductors at Intel. DCCD control was formerly achieved through manual adjustments of the exposure dose on the tool to account for the known effects of non-stationary tool/process drift. An automated application EFCC (Exposure-Focus CD Control) was developed at Intel, to create a robust algorithm and automated implementation, replacing the manual adjustment process. The EFCC algorithm uses DCCD summary measurements as the feedback to the stepper. At the stepper, the exposure setting is adjusted to correct for non-stationary tool/process drift. A weighted average of data from previous lots is used to determine the recommended exposure dose settings. The feedback scheme weights prior lots using a combination of traditional EWMA based weighting and within lot (across sites on wafer) variance based weighting. The EFCC implementation has benefits in increased Cpk, reduced rework, continuous adjustment. Futhermore, as this is an automated control solution, it can easily be extended to support more sophisticated adjustment algorithms.

Paper Details

Date Published: 1 July 2003
PDF: 7 pages
Proc. SPIE 5044, Advanced Process Control and Automation, (1 July 2003); doi: 10.1117/12.485312
Show Author Affiliations
Anju Narendra, Intel Corp. (United States)
Steven L. Carson, Intel Corp. (United States)
Cynthia Morrison, Intel Corp. (United States)


Published in SPIE Proceedings Vol. 5044:
Advanced Process Control and Automation
Matt Hankinson; Christopher P. Ausschnitt, Editor(s)

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