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Proceedings Paper

Cu integrated metrology for volume DRAM manufacturing
Author(s): Ron Goldner; Etay M. Bransky; M. Sendler; David Kaufman; A. Weingarten; A. Ravid; Yoel Cohen; J. M. Durning
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Paper Details

Date Published:
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Proc. SPIE 5044, Advanced Process Control and Automation, ; doi: 10.1117/12.485292
Show Author Affiliations
Ron Goldner, Nova Measuring Instruments Inc. (United States)
Etay M. Bransky, Nova Measuring Instruments Inc. (United States)
M. Sendler, Nova Measuring Instruments Inc. (United States)
David Kaufman, Nova Measuring Instruments, Ltd. (Israel)
A. Weingarten, Nova Measuring Instruments, Ltd. (Israel)
A. Ravid, Nova Measuring Instruments, Ltd. (Israel)
Yoel Cohen, Nova Measuring Instruments, Ltd. (Israel)
J. M. Durning, Micron Technologies, Inc. (United States)


Published in SPIE Proceedings Vol. 5044:
Advanced Process Control and Automation
Matt Hankinson; Christopher P. Ausschnitt, Editor(s)

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