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Proceedings Paper

Imaging and photochemistry studies of fluoropolymers for 193-nm lithography
Author(s): Will Conley; Paul Zimmerman; Daniel Miller; Guen Su Lee
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Paper Abstract

The authors have studied the impact of absorbance on the overall process window. The chemical contrast has been monitored by FTIR to understand the overall effect of absorbance through careful modulation of absorbing additives 193nm. The effects of absorbance and contrast has been simulated and through experimentation confirmed. The authors will provide comprehensive details of the synthesis of polymers, additives and impact on 157nm lithography.

Paper Details

Date Published: 12 June 2003
PDF: 6 pages
Proc. SPIE 5039, Advances in Resist Technology and Processing XX, (12 June 2003); doi: 10.1117/12.485204
Show Author Affiliations
Will Conley, International SEMATECH (United States)
Paul Zimmerman, International SEMATECH (United States)
Daniel Miller, International SEMATECH (United States)
Guen Su Lee, International SEMATECH (United States)


Published in SPIE Proceedings Vol. 5039:
Advances in Resist Technology and Processing XX
Theodore H. Fedynyshyn, Editor(s)

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