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Proceedings Paper

Low pitch dependence of RELACS process of ArF lithography for 65-nm generation
Author(s): Jen-Chieh Shih; Shang-Ho Lin; Harrison Chen; Bang-Ching Ho
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Proc. SPIE 5039, Advances in Resist Technology and Processing XX, ; doi: 10.1117/12.485176
Show Author Affiliations
Jen-Chieh Shih, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Shang-Ho Lin, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Harrison Chen, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Bang-Ching Ho, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)


Published in SPIE Proceedings Vol. 5039:
Advances in Resist Technology and Processing XX
Theodore H. Fedynyshyn, Editor(s)

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