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Proceedings Paper

Polymer dynamics and diffusive properties in ultrathin photoresist films
Author(s): Christopher L. Soles; Ronald L. Jones; Joseph L. Lenhart; Vivek M. Prabhu; Wen-li Wu; Eric K. Lin; Dario L. Goldfarb; Marie Angelopoulos
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Paper Abstract

A series of experiments are presented to demonstrate thin film confinement effects on the diffusive properties in poly(tert-butoxycarboxystyrene) (PBOCSt). Bilayer diffusion couple measurements reveal that as the thickness of a PBOCSt film is decreased, the kinetics of the deprotection reaction-front propagation (a process involving both the diffusion and reaction of photochemically activated acidic protons) are dramatically hindered. Incoherent neutron scattering measurements suggest that this retardation can be traced to a suppression of local fast relaxations (200 MHz or faster) native to the PBOCSt polymer. The reduced mobility in the thin PBOCSt films is further confirmed with moisture vapor uptake studies performed on a quartz crystal microbalance (QCM). As the film thickness drops below 500 Angstrom there is a strong reduction in the diffusivity of water in the film. In total, these are the first evidences suggesting that the deviations in lithographic performance with decreasing film thickness observed with the bilayer experiments can are due to changes in mobility, not reactivity, within a chemically amplified resist.

Paper Details

Date Published: 12 June 2003
PDF: 10 pages
Proc. SPIE 5039, Advances in Resist Technology and Processing XX, (12 June 2003); doi: 10.1117/12.485140
Show Author Affiliations
Christopher L. Soles, National Institute of Standards and Technology (United States)
Ronald L. Jones, National Institute of Standards and Technology (United States)
Joseph L. Lenhart, National Institute of Standards and Technology (United States)
Vivek M. Prabhu, National Institute of Standards and Technology (United States)
Wen-li Wu, National Institute of Standards and Technology (United States)
Eric K. Lin, National Institute of Standards and Technology (United States)
Dario L. Goldfarb, IBM Thomas J. Watson Research Ctr. (United States)
Marie Angelopoulos, IBM Thomas J. Watson Research Ctr. (United States)


Published in SPIE Proceedings Vol. 5039:
Advances in Resist Technology and Processing XX
Theodore H. Fedynyshyn, Editor(s)

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