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Proceedings Paper

Novel apparatus for the uniform heating of substrates during post expose bake
Author(s): Gary Hillman; Pierre Infelta
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Paper Abstract

It is well known that the use of Chemically Activated Resists (CAR) or Chemically Enhanced Resists (CER) require that the Post Exposure Bake be extremely uniform at temperature ramp and at the steady state as Critical Dimension control is strongly dependent upon bake temperature. A novel, simple and robust method of obtaining near perfect bake temperature uniformity and the enhanced results obtained thereby are discussed.

Paper Details

Date Published: 12 June 2003
PDF: 8 pages
Proc. SPIE 5039, Advances in Resist Technology and Processing XX, (12 June 2003); doi: 10.1117/12.485109
Show Author Affiliations
Gary Hillman, Creative Design Corp. (United States)
Pierre Infelta, Swiss Federal Institute of Technology Lausanne (Switzerland)


Published in SPIE Proceedings Vol. 5039:
Advances in Resist Technology and Processing XX
Theodore H. Fedynyshyn, Editor(s)

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