Share Email Print
cover

Proceedings Paper

Alicyclic photoresists for CO2-based microlithography at 157 nm
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Norbornene-based monomers were synthesized to include fluorinated moieties and/or chemical amplification switching groups. Polymers to be used as potential resist materials were synthesized from these monomers by addition polymerization using allylpalladium chloride dimmer. Monomers and polymers have been identified and partially characterized for important lithographic properties.

Paper Details

Date Published: 12 June 2003
PDF: 5 pages
Proc. SPIE 5039, Advances in Resist Technology and Processing XX, (12 June 2003); doi: 10.1117/12.485093
Show Author Affiliations
Mary Kate Boggiano, Univ. of North Carolina/Chapel Hill (United States)
Joseph M. DeSimone, Univ. of North Carolina/Chapel Hill (United States)
North Carolina State Univ. (United States)


Published in SPIE Proceedings Vol. 5039:
Advances in Resist Technology and Processing XX
Theodore H. Fedynyshyn, Editor(s)

© SPIE. Terms of Use
Back to Top