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Proceedings Paper

Fluorinated materials for 157-nm lithography
Author(s): Andrew Poss; David Nalewajek; Hari Nair
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Paper Abstract

Theoretical absorption spectra at 157 nm for a variety of fluorinated norbornene monomers were calculated by time dependent-density functional theory (TD.DFT). Based on the theoretical spectra, we have prepared a number of fluorinated norbornene monomers via different synthetic routes. Norbornene based fluorinated monomers were readily prepared from commercially available starting materials in good yields.

Paper Details

Date Published: 12 June 2003
PDF: 6 pages
Proc. SPIE 5039, Advances in Resist Technology and Processing XX, (12 June 2003); doi: 10.1117/12.485088
Show Author Affiliations
Andrew Poss, Honeywell International, Inc. (United States)
David Nalewajek, Honeywell International, Inc. (United States)
Hari Nair, Honeywell International, Inc. (United States)


Published in SPIE Proceedings Vol. 5039:
Advances in Resist Technology and Processing XX
Theodore H. Fedynyshyn, Editor(s)

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