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Proceedings Paper

Novel main-chain-fluorinated polymers for 157-nm photoresists
Author(s): Minoru Toriumi; Meiten Koh; Takuji Ishikawa; T. Kodani; Takayuki Araki; Hirokazu Aoyama; Tsuneo Yamashita; Tamio Yamazaki; Takamitsu Furukawa; Toshiro Itani
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Paper Abstract

Main-chain-fluorinated base-resins, including tetrafluoroethylene and norbornene derivatives, were synthesized and their fundamental properties, such as transparency at 157 nm and solubility in a standard alkaline developer, were characterized. A high transparency, i.e., absorbance of less then 0.5 μm-1, was achieved by optimizing the polymerization conditions with a variety of counter monomers. It was found that the polymerization conditions could also control the dissolution rates of the fluoropolymers and increased the dissolution rate of unprotected fluoropolymers by about three orders of magnitude, which was sufficient for the alkaline developability. Positive-working resists based on fluororesins were developed and showed good transparency of less than 1 μm-1 at 157 nm, and good solubility in a standard alkaline solution of 0.26-N tetramethylammonium (without any swelling behavior). And an acceptable etching rate as resistant as ArF resists was obtained and 65-nm dense lines could be delineated by the exposure at 157-nm wavelength.

Paper Details

Date Published: 12 June 2003
PDF: 8 pages
Proc. SPIE 5039, Advances in Resist Technology and Processing XX, (12 June 2003); doi: 10.1117/12.485085
Show Author Affiliations
Minoru Toriumi, Daikin Industries Co., Ltd. (Japan)
Meiten Koh, Daikin Industries Co., Ltd. (Japan)
Takuji Ishikawa, Daikin Industries Co., Ltd. (Japan)
T. Kodani, Daikin Industries Co., Ltd. (Japan)
Takayuki Araki, Daikin Industries Co., Ltd. (Japan)
Hirokazu Aoyama, Daikin Industries Co., Ltd. (Japan)
Tsuneo Yamashita, Daikin Industries Co., Ltd. (Japan)
Tamio Yamazaki, Semiconductor Leading Edge Technologies, Inc. (Japan)
Takamitsu Furukawa, Semiconductor Leading Edge Technologies, Inc. (Japan)
Toshiro Itani, Semiconductor Leading Edge Technologies, Inc. (Japan)


Published in SPIE Proceedings Vol. 5039:
Advances in Resist Technology and Processing XX
Theodore H. Fedynyshyn, Editor(s)

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