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Proceedings Paper

Will Darwin's law help us to improve our resist models?
Author(s): Bernd Tollkuhn; Tim Fuehner; Daniela Matiut; Andreas Erdmann; Armin Semmler; Bernd Kuechler; Gabriella Kokai
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Paper Abstract

Calibration of resist model parameters becomes more and more important in lithography simulation. The general goal of such a calibration procedure is to find parameters and model options which minimize the difference between experimentally measured and simulated data. In this paper a multidimensional downhill simplex method and a genetic algorithm are introduced. We investigate the performance of different modeling options such as the diffusivity of the photogenerated acid and of the quencher base, and different development models. Furthermore, new objective functions are proposed and evaluated: The overlap of process windows between simulated and experimental data and the comparison of linearity curves. The calibration procedures are performed for a 248nm and for a 193nm chemically amplified resist, respectively.

Paper Details

Date Published: 12 June 2003
PDF: 12 pages
Proc. SPIE 5039, Advances in Resist Technology and Processing XX, (12 June 2003); doi: 10.1117/12.485078
Show Author Affiliations
Bernd Tollkuhn, Fraunhofer-Institut fur Integrierte Systeme und Bauelementetechnologie (Germany)
Tim Fuehner, Fraunhofer-Institut fur Integrierte Systeme und Bauelementetechnologie (Germany)
Daniela Matiut, Fraunhofer-Institut fur Integrierte Systeme und Bauelementetechnologie (Germany)
Andreas Erdmann, Fraunhofer-Institut fur Integrierte Systeme und Bauelementetechnologie (Germany)
Armin Semmler, Infineon Technologies AG (Germany)
Bernd Kuechler, Infineon Technologies AG (Germany)
Gabriella Kokai, Friedrich-Alexander-Univ. Erlangen-Nurnberg (Germany)


Published in SPIE Proceedings Vol. 5039:
Advances in Resist Technology and Processing XX
Theodore H. Fedynyshyn, Editor(s)

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