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Proceedings Paper

Synthesis of novel fluorinated norbornene derivatives for 157-nm application
Author(s): Meiten Koh; Takuji Ishikawa; Minoru Toriumi; Takayuki Araki; Tsuneo Yamashita; Hirokazu Aoyama; Tamio Yamazaki; Takamitsu Furukawa; Toshiro Itani
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Paper Abstract

We have synthesized various main-chain fluorinated polymers and studied their transparency and solubility. The main-chain fluorinated polymers were synthesized by co- or ter-polmerization of tetrafluoeoethylene (TFE) with cyclic monomers, especially TFE with newly synthesized norbornene derivatives. Transparency of the main-chain fluorinated polymers tended to be higher with higher fluorine contents. But exact absorbance of the main-chain fluorinated polymers by modifying the STUPID calculation. Solubility of the main-chain fluorinated polymers functionalized by hydroxyfluoroalkyl groups was also studied. We have developed a model to predict pKa of hydroxyfluoroalkyl groups incorporated in the norbornene derivatives, and studied correlation between pKa(OH) and solubility of the co-polymers of the hydroxyfluoroalkyl-functionalized norbornene derivatives with TFE. pKa Of the hydroxyfluoroalkyl groups were lower with higher fluorine contents, and solubility of the co-polymers tended to be higher with lower pKa of the hydroxyalkyl groups.

Paper Details

Date Published: 12 June 2003
PDF: 11 pages
Proc. SPIE 5039, Advances in Resist Technology and Processing XX, (12 June 2003); doi: 10.1117/12.485077
Show Author Affiliations
Meiten Koh, Daikin Industries Co., Ltd. (Japan)
Takuji Ishikawa, Daikin Industries Co., Ltd. (Japan)
Minoru Toriumi, Daikin Industries Co., Ltd. (Japan)
Takayuki Araki, Daikin Industries Co., Ltd. (Japan)
Tsuneo Yamashita, Daikin Industries Co., Ltd. (Japan)
Hirokazu Aoyama, Daikin Industries Co., Ltd. (Japan)
Tamio Yamazaki, Semiconductor Leading Edge Technologies, Inc. (Japan)
Takamitsu Furukawa, Semiconductor Leading Edge Technologies, Inc. (Japan)
Toshiro Itani, Semiconductor Leading Edge Technologies, Inc. (Japan)


Published in SPIE Proceedings Vol. 5039:
Advances in Resist Technology and Processing XX
Theodore H. Fedynyshyn, Editor(s)

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