Share Email Print
cover

Proceedings Paper

Development and characterization of new 157-nm photoresists based on advanced fluorinated polymers
Author(s): Tamio Yamazaki; Takamitsu Furukawa; Toshiro Itani; Takuji Ishikawa; Meiten Koh; Takayuki Araki; Minoru Toriumi; T. Kodani; Hirokazu Aoyama; Tsuneo Yamashita
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Fluorinated polymers show a good transparency at the 157-nm exposure wavelength for single-layer resists. We have developed fluorinated resist polymers for 157-nm lithography. These polymers are main-chain fluorinated polymers synthesized by the co-polymerization of tetrafluoroethylene (TFE) and polymers such as poly(TFE/norbornene/α-fluoroolefin) fluoropolymers (FP1). In this paper, a number of polymerization initiators were evaluated in the polymerization of PF1-type polymers in order to investigate the effect of polymer end groups on optical and dissolution properties. We found that the polymer end group greatly affects the dissolution properties of these polymers when using a standard 0.26N tetramethylammonium hydroxide (TMAH) aqueous developer solution. These end groups also affect the polymer transparencies at 157-nm, and the resulting lithographic performance. The fluorocarbon initiator named “F2” induced the lowered absorbance (~0.4μm-1) and an increase in the dissolution rate (~300 nm/sec) without noticeable amounts of swelling. These polymer-based resists can achieve a resolution of less than 60-nm using a 157-nm laser microstepper (NA=0.85) with a Levenson-type strong phase shifting mask.

Paper Details

Date Published: 12 June 2003
PDF: 10 pages
Proc. SPIE 5039, Advances in Resist Technology and Processing XX, (12 June 2003); doi: 10.1117/12.485046
Show Author Affiliations
Tamio Yamazaki, Semiconductor Leading Edge Technologies, Inc. (Japan)
Takamitsu Furukawa, Semiconductor Leading Edge Technologies, Inc. (Japan)
Toshiro Itani, Semiconductor Leading Edge Technologies, Inc. (Japan)
Takuji Ishikawa, Daikin Industries Co., Ltd. (Japan)
Meiten Koh, Daikin Industries Co., Ltd. (Japan)
Takayuki Araki, Daikin Industries Co., Ltd. (Japan)
Minoru Toriumi, Daikin Industries Co., Ltd. (Japan)
T. Kodani, Daikin Industries Co., Ltd. (Japan)
Hirokazu Aoyama, Daikin Industries Co., Ltd. (Japan)
Tsuneo Yamashita, Daikin Industries Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 5039:
Advances in Resist Technology and Processing XX
Theodore H. Fedynyshyn, Editor(s)

© SPIE. Terms of Use
Back to Top