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Proceedings Paper

CD control at low K1 optical lithography in DRAM device
Author(s): Jongkyun Hong; Chongsik Woo; Jaewoo Park; Byeong-ho Cho; Jaeseung Choi; Hyunjo Yang; Chan-ha Park; Yong-chul Shin; Youngdea Kim; Goomin Jeong; Jung-chan Kim; Khil-ohk Kang; Chunsoo Kang; Jongwoon Park; Donggyu Yim; Youngwook Song
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Paper Abstract

In this work, CD control issue at 0.37 K1 optical lithography will be discussed in terms of lens aberration sensitivity. Specific aberration terms that affect CD asymmetry on isolation, word line and storage node layers were investigated by simulation and CD uniformity measurement. The lens aberration was characterized by LITEL ISI (In-Situ Interferometer) and the aberration sensitivity was investigated by Solid-C aerial image simulation. From this result, we can understand the relation between some significant Zernike terms and CD control of DRAM’s critical layers.

Paper Details

Date Published: 2 June 2003
PDF: 9 pages
Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); doi: 10.1117/12.485026
Show Author Affiliations
Jongkyun Hong, Hynix Semiconductor Inc. (South Korea)
Chongsik Woo, Hynix Semiconductor Inc. (South Korea)
Jaewoo Park, Hynix Semiconductor Inc. (South Korea)
Byeong-ho Cho, Hynix Semiconductor Inc. (South Korea)
Jaeseung Choi, Hynix Semiconductor Inc. (South Korea)
Hyunjo Yang, Hynix Semiconductor Inc. (South Korea)
Chan-ha Park, Hynix Semiconductor Inc. (South Korea)
Yong-chul Shin, Hynix Semiconductor Inc. (South Korea)
Youngdea Kim, Hynix Semiconductor Inc. (South Korea)
Goomin Jeong, Hynix Semiconductor Inc. (South Korea)
Jung-chan Kim, Hynix Semiconductor Inc. (South Korea)
Khil-ohk Kang, Hynix Semiconductor Inc. (South Korea)
Chunsoo Kang, Hynix Semiconductor Inc. (South Korea)
Jongwoon Park, Hynix Semiconductor Inc. (South Korea)
Donggyu Yim, Hynix Semiconductor Inc. (South Korea)
Youngwook Song, Hynix Semiconductor Inc. (South Korea)


Published in SPIE Proceedings Vol. 5038:
Metrology, Inspection, and Process Control for Microlithography XVII
Daniel J. Herr, Editor(s)

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