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Proceedings Paper

Subfield scheduling for throughput maximization in electron-beam photomask fabrication
Author(s): Sergey V. Babin; Andrew B. Kahng; Ion I. Mandoiu; Swamy Muddu
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Paper Abstract

Resist heating is one of the largest contributors to critical dimension (CD) distortion in electron beam photomask fabrication. Previous methods for reducing CD variation caused by resist heating include lower beam currents, increased delays between electron flashes, and writing in multiple passes. However, all these methods lower mask writing throughput. This leads to increased mask writing cost, which is increasingly becoming a major limiting factor to semiconductor industry productivity. In this work, we investigate a new degree of freedom for mitigating CD distortion caused by resist heating. By optimizing the sequence in which subfields are being written, it is possible to reduce CD variability caused by resist heating, without significantly increasing the mask writing time.

Paper Details

Date Published: 16 June 2003
PDF: 9 pages
Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); doi: 10.1117/12.484981
Show Author Affiliations
Sergey V. Babin, Soft Services (United States)
Andrew B. Kahng, Univ. of California/San Diego (United States)
Ion I. Mandoiu, Univ. of California/San Diego (United States)
Swamy Muddu, Univ. of California/San Diego (United States)

Published in SPIE Proceedings Vol. 5037:
Emerging Lithographic Technologies VII
Roxann L. Engelstad, Editor(s)

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