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Proceedings Paper

Nikon EB stepper: its system design and preliminary performance
Author(s): Noriyuki Hirayanagi; Tomoharu Fujiwara; Kazunari Hada; Toshimasa Shimoda; Kazuaki Suzuki
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Paper Abstract

Electron Projection Lithography (EPL) has a high potential for applicability beyond the ITRS 65 nm node, especially for contacts and gate layers. The concept of synchronization control of the Nikon EB stepper is explained. The reticle stage and the wafer stage are servo controlled to target positions individually. The residual stage position errors are compensated by the electron beam deflection control. The electron beam deflection is feed forward controlled using predicted stage position data from a subsystem called “Filter/Predictor”. The performance of the stage position prediction of the Filter/Predictor is described. This paper also reports the performance of the first EB stepper tool, the NSR-EB1A, during its preliminary adjustment phase. Dynamic scanning and stitching exposure, which requires synchronization of both the beam deflection motion and the stage scanning motion, was realized. Dynamic resolution of 100 nm and dynamic subfield stitching accuracy of 25 nm (3sigma) were obtained, and further improvement is expected.

Paper Details

Date Published: 16 June 2003
PDF: 8 pages
Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); doi: 10.1117/12.484972
Show Author Affiliations
Noriyuki Hirayanagi, Nikon Corp. (Japan)
Tomoharu Fujiwara, Nikon Corp. (Japan)
Kazunari Hada, Nikon Corp. (Japan)
Toshimasa Shimoda, Nikon Corp. (Japan)
Kazuaki Suzuki, Nikon Corp. (Japan)


Published in SPIE Proceedings Vol. 5037:
Emerging Lithographic Technologies VII
Roxann L. Engelstad, Editor(s)

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