Share Email Print
cover

Proceedings Paper

Design and performance of capping layers for EUV multilayer mirrors
Author(s): Sasa Bajt; Henry N Chapman; Nhan Nguyen; Jennifer B. Alameda; Jeffrey C. Robinson; Michael E. Malinowski; Eric Gullikson; Andy Aquila; Charles Tarrio; Steven Grantham
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

The reflectance stability of multilayer coatings for extreme ultraviolet lithography (EUVL) in a commercial tool environment is of utmost importance to ensure continuous exposures with minimum maintenance cost. We have made substantial progress in designing the protective capping layer coatings, understanding their performance and estimating their lifetimes based on accelerated electron beam and EUV exposure studies. Our current capping layer coatings have about 40 times longer lifetimes than Si-capped multilayer optics. Nevertheless, the lifetime of current Ru-capped multilayers is too short to satisfy commercial tool requirements and further improvements are essential.

Paper Details

Date Published: 16 June 2003
PDF: 13 pages
Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); doi: 10.1117/12.484966
Show Author Affiliations
Sasa Bajt, Lawrence Livermore National Lab. (United States)
Henry N Chapman, Lawrence Livermore National Lab. (United States)
Nhan Nguyen, Lawrence Livermore National Lab. (United States)
Jennifer B. Alameda, Lawrence Livermore National Lab. (United States)
Jeffrey C. Robinson, Lawrence Livermore National Lab. (United States)
Michael E. Malinowski, Sandia National Labs. (United States)
Eric Gullikson, Lawrence Berkeley National Lab. (United States)
Andy Aquila, Lawrence Berkeley National Lab. (United States)
Charles Tarrio, National Institute of Standards and Technology (United States)
Steven Grantham, National Institute of Standards and Technology (United States)


Published in SPIE Proceedings Vol. 5037:
Emerging Lithographic Technologies VII
Roxann L. Engelstad, Editor(s)

© SPIE. Terms of Use
Back to Top