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Proceedings Paper

Development of an experimental EUV interferometer for benchmarking several EUV wavefront metrology schemes
Author(s): Katsuhiko Murakami; Jun Saito; Kazuya Ota; Hiroyuki Kondo; Mikihiko Ishii; Jun Kawakami; Tetsuya Oshino; Katsumi Sugisaki; Yucong Zhu; Masanobu Hasegawa; Yoshiyuki Sekine; Seiji Takeuchi; Chidane Ouchi; Osamu Kakuchi; Yutaka Watanabe; Takayuki Hasegawa; Shinichi Hara; Akiyoshi Suzuki
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Paper Abstract

An experimental extreme UV (EUV) interferometer (EEI) using an undulator light source was designed and constructed for the purpose of developing wavefront measurement technology with the exposure wavelength of the projection optics of EUV lithography systems. EEI has the capability of performing five different EUV wavefront metrology methods.

Paper Details

Date Published: 16 June 2003
PDF: 8 pages
Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); doi: 10.1117/12.484935
Show Author Affiliations
Katsuhiko Murakami, Association of Super-Advanced Electronics Technologies (Japan)
Jun Saito, Association of Super-Advanced Electronics Technologies (Japan)
Kazuya Ota, Association of Super-Advanced Electronics Technologies (Japan)
Hiroyuki Kondo, Association of Super-Advanced Electronics Technologies (Japan)
Mikihiko Ishii, Association of Super-Advanced Electronics Technologies (Japan)
Jun Kawakami, Association of Super-Advanced Electronics Technologies (Japan)
Tetsuya Oshino, Association of Super-Advanced Electronics Technologies (Japan)
Katsumi Sugisaki, Association of Super-Advanced Electronics Technologies (Japan)
Yucong Zhu, Association of Super-Advanced Electronics Technologies (Japan)
Masanobu Hasegawa, Association of Super-Advanced Electronics Technologies (Japan)
Yoshiyuki Sekine, Association of Super-Advanced Electronics Technologies (Japan)
Seiji Takeuchi, Association of Super-Advanced Electronics Technologies (Japan)
Chidane Ouchi, Association of Super-Advanced Electronics Technologies (Japan)
Osamu Kakuchi, Association of Super-Advanced Electronics Technologies (Japan)
Yutaka Watanabe, Association of Super-Advanced Electronics Technologies (Japan)
Takayuki Hasegawa, Association of Super-Advanced Electronics Technologies (Japan)
Shinichi Hara, Association of Super-Advanced Electronics Technologies (Japan)
Akiyoshi Suzuki, Association of Super-Advanced Electronics Technologies (Japan)


Published in SPIE Proceedings Vol. 5037:
Emerging Lithographic Technologies VII
Roxann L. Engelstad, Editor(s)

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