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Proceedings Paper

Development of radiation-magnetohydrodynamic computer modeling of gas-discharge EUV sources for microlithography
Author(s): Bruno S. Bauer; Andrey Esaulov; Volodymyr Makhin; Roberto C. Mancini; Ioana Paraschiv; Radu Presura; Irvin R. Lindemuth; Peter T. Sheehey; Bryan J. Rice
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Paper Abstract

A radiation-magnetohydrodynamic (MHD) model of gas discharges has been developed to accelerate the development of compact, intense sources of EUV radiation for microlithography. The model is an MHD numerical simulation with atomic and radiation physics. The plasma evolution is simulated with the MHRDR (Magneto-Hydro-Radiative-Dynamic-Research) 2D, three-temperature, MHD computer code. The MHD results are postprocessed with a code that calculates the 13.4-nm EUV radiation output from Xe ions, based on a detailed collisional-radiative atomic kinetics model. Modeling of a dense plasma focus discharge, in a Xe-He gas mixture, has been initiated with this new tool.

Paper Details

Date Published: 16 June 2003
PDF: 11 pages
Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); doi: 10.1117/12.484933
Show Author Affiliations
Bruno S. Bauer, Univ. of Nevada/Reno (United States)
Andrey Esaulov, Univ. of Nevada/Reno (United States)
Volodymyr Makhin, Univ. of Nevada/Reno (United States)
Roberto C. Mancini, Univ. of Nevada/Reno (United States)
Ioana Paraschiv, Univ. of Nevada/Reno (United States)
Radu Presura, Univ. of Nevada/Reno (United States)
Irvin R. Lindemuth, Los Alamos National Lab. (United States)
Peter T. Sheehey, Los Alamos National Lab. (United States)
Bryan J. Rice, Intel Corp. (United States)

Published in SPIE Proceedings Vol. 5037:
Emerging Lithographic Technologies VII
Roxann L. Engelstad, Editor(s)

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