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Proceedings Paper

Use of tin as a plasma source material for high conversion efficiency
Author(s): Toshihisa Tomie; Tatsuya Aota; Yoshifumi Ueno; Gohta Niimi; Hidehiko Yashiro; Jingqian Lin; Isao Matsushima; Kazumasa Komiyama; Dong-Hoon Lee; Kentaro Nishigori; Hiroshi Yokota
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Paper Abstract

Debris-free generation of a tin plasma was demonstrated in the cavity-confined configuration. Narrow band emission at 13.7-nm was observed in an emission spectrum of a cavity confined tin plasma. The spectral efficiency was as high as 12% and we found the conversion efficiency could reach 6%/2π str ultimately while lots of works are required to achieve this value. We also confirmed a magnetic field has some effect of stopping a plasma.

Paper Details

Date Published: 16 June 2003
PDF: 9 pages
Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); doi: 10.1117/12.483751
Show Author Affiliations
Toshihisa Tomie, National Institute of Advanced Industrial Science and Technology (Japan)
Tatsuya Aota, Japan Society for the Promotion of Science (Japan)
Yoshifumi Ueno, Association of Super-Advanced Electronic Technologies (Japan)
Gohta Niimi, National Institute of Advanced Industrial Science and Technology (Japan)
Hidehiko Yashiro, National Institute of Advanced Industrial Science and Technology (Japan)
Jingqian Lin, National Institute of Advanced Industrial Science and Technology (Japan)
Isao Matsushima, National Institute of Advanced Industrial Science and Technology (Japan)
Kazumasa Komiyama, Tokyo Science Univ. (Japan)
Dong-Hoon Lee, National Institute of Advanced Industrial Science and Technology (Japan)
Kentaro Nishigori, National Institute of Advanced Industrial Science and Technology (Japan)
Hiroshi Yokota, Shinshu Univ. (Japan)


Published in SPIE Proceedings Vol. 5037:
Emerging Lithographic Technologies VII
Roxann L. Engelstad, Editor(s)

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