Share Email Print
cover

Proceedings Paper

Quantum efficiency of PAG decomposition in different polymer matrices at advanced lithographic wavelengths
Author(s): Theodore H. Fedynyshyn; Roger F. Sinta; William A. Mowers; Alberto Cabral
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

The Dill ABC parameters for optical resists are typically determined by measuring the change in the intensity of transmitted light at the wavelength of interest as a function of incident energy. The effectiveness of the experiment rests with the fact that the resist optical properties change with exposure and that the optical properties are directly related to the concentration of PAG compound. These conditions are not typically satisfied in CA resists and thus C is unobtainable by this method. FT-IR spectroscopy can directly measure changes in the photoactive species by isolating and measuring absorbance peaks unique to the photoactive species. We employed the ProABC software, specially modified to allow FT-IR absorbance input, to extract ABS parameters through a best fit of the lithography model to experimental data. The quantum efficiency of PAG decomposition at 157-, 193-, and 248-nm was determined for four diazomethane type PAGs in four different polymer matrices. It was found that both the Dill C parameter and the quantum efficiency for all PAGs increased as wavelength decreased, but that the magnitude of the increase was strongly dependent on the polymer matrix.

Paper Details

Date Published: 12 June 2003
PDF: 12 pages
Proc. SPIE 5039, Advances in Resist Technology and Processing XX, (12 June 2003); doi: 10.1117/12.483705
Show Author Affiliations
Theodore H. Fedynyshyn, Massachusetts Institute of Technology (United States)
Roger F. Sinta, Massachusetts Institute of Technology (United States)
William A. Mowers, Massachusetts Institute of Technology (United States)
Alberto Cabral, Massachusetts Institute of Technology (United States)


Published in SPIE Proceedings Vol. 5039:
Advances in Resist Technology and Processing XX
Theodore H. Fedynyshyn, Editor(s)

© SPIE. Terms of Use
Back to Top