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Proceedings Paper

Development of Xe-filled capillary discharge extreme-ultraviolet radiation source for semiconductor lithography
Author(s): Yusuke Teramoto; Hiroto Sato; Kazunori Bessho; Koji Miyauchi; Mitsuru Ikeuchi; Keisuke Okubo; Masaki Yoshioka; Koichi Toyoda
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Paper Abstract

An EUV radiation source development with discharge-produced plasma (DPP) has been started in Gotenba branch of EUVA Hiratsuka R&D center. For the early stage of the development, fundamental characteristics of DPP including current, voltage, EUV energy and spectrum in EUV region were studied. A capillary of which the inner diameter was 2.3 mm, and Xe gas were used as a source to be expected in-band EUV radiation from magnetically-compressed Z-pinch plasma. An all-solid-state magnetic pulse compression generator was employed, which can deliver the current of 14 kA into the capillary load with the rise time of approximately 500 ns. In-band EUV energy and spectroscopic measurements were carried out. It was found that the in-band EUV energy increased with increasing the current amplitude and/or pressure of filled Xe gas. The highest in-band EUV energy obtained was 8 mJ per unit solid angle.

Paper Details

Date Published: 16 June 2003
PDF: 9 pages
Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); doi: 10.1117/12.483704
Show Author Affiliations
Yusuke Teramoto, Extreme Ultraviolet Lithography System Development Association (Japan)
Hiroto Sato, Extreme Ultraviolet Lithography System Development Association (Japan)
Kazunori Bessho, Extreme Ultraviolet Lithography System Development Association (Japan)
Koji Miyauchi, Extreme Ultraviolet Lithography System Development Association (Japan)
Mitsuru Ikeuchi, Extreme Ultraviolet Lithography System Development Association (Japan)
Keisuke Okubo, Extreme Ultraviolet Lithography System Development Association (Japan)
Masaki Yoshioka, Extreme Ultraviolet Lithography System Development Association (Japan)
Koichi Toyoda, Tokyo Univ. of Science (Japan)


Published in SPIE Proceedings Vol. 5037:
Emerging Lithographic Technologies VII
Roxann L. Engelstad, Editor(s)

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