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Proceedings Paper

Cr and MoSi photomask plasma etching
Author(s): Banqiu Wu; David Y. Chan
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Paper Abstract

The Advanced Metrology Advisory Group (AMAG) is a council composed of the chief CD-metrologists from the International SEMATECH consortium's Member Companies and from the National Institute of Standards (NIST). The AMAG wrote, in 2002, with CD-SEM supplier involvement, updated the 'Unified Advanced CD-SEM Specification for Sub-130nm Technology (version 2002)' to be a living document which outlines the required performance of advanced CD-SEMs for supplier compliance to the 2001 International Technology Roadmap for Semiconductors, and also conveys other member companies' collective needs to vendors. Using this specification, a benchmarking effort of the currently available advanced CD-SEMs will be performed. As these results are not yet complete, they will be presented at a future date. However, the current version of the specification has undergone many changes and improvements from the last, and these will be discussed here.

Paper Details

Date Published: 2 June 2003
PDF: 12 pages
Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); doi: 10.1117/12.483666
Show Author Affiliations
Banqiu Wu, Photronics Inc. (United States)
David Y. Chan, Photronics Inc. (United States)

Published in SPIE Proceedings Vol. 5038:
Metrology, Inspection, and Process Control for Microlithography XVII
Daniel J. Herr, Editor(s)

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