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Proceedings Paper

Zero-shrink dimension evaluated for ArF-resist patterns measured by CD-SEM
Author(s): Hiroki Kawada; Takashi Iizumi; Tadashi Otaka
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Paper Abstract

Resist patterns for ArF-laser lithography slim by electron radiation in Critical Dimension-Scanning Electron Microscope (CD-SEM). To estimate initial CD that includes no LWS, the CD at 0th measurement was extrapolated from shrink-curve that indicates the slimming. Invisible slimming, occurring between the 0th and 1st measurement, was estimated. We made software for CD-SEM to calculate the 0th-CD. Estimation error in the extrapolated 0th-CD was estimated less than 0.9 nm, and the overall slimming including the invisible shrink was 0.3 nm in line-shaped patterns.

Paper Details

Date Published: 2 June 2003
PDF: 5 pages
Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); doi: 10.1117/12.483658
Show Author Affiliations
Hiroki Kawada, Hitachi High-Technologies Corp. (Japan)
Takashi Iizumi, Hitachi High-Technologies Corp. (Japan)
Tadashi Otaka, Hitachi High-Technologies Corp. (Japan)


Published in SPIE Proceedings Vol. 5038:
Metrology, Inspection, and Process Control for Microlithography XVII
Daniel J. Herr, Editor(s)

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