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Proceedings Paper

Physical properties of the HCT EUV source
Author(s): Joseph Pankert; Klaus Bergmann; Juergen Klein; Willi Neff; Oliver Rosier; Stefan Seiwert; Christopher Smith; Sven Probst; Dominik Vaudrevange; Guido Siemons; Rolf Apetz; Jeroen Jonkers; Michael Loeken; Eric Bosch; Guenther H. Derra; Thomas Kruecken; Peter Zink
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Paper Abstract

The paper describes recent progress on the development of an EUV source based on a hollow cathode triggered gas discharge (HCT). The principle of operation has been described in previous publications. When operated with Xe, a repetition frequency up to 4 kHz, conversion efficiency of 0.55% inband radiation in 2π and a pinch size below 3mm in length was demonstrated. Today's requirements on a commercial EUV source for volume production of wafers still exceed the current performance by large factors both in terms of output power and life time. This paper will discuss the roadmap to high power and will also show elements of the way to extended life time. Particular focus will be put onto the physical limits of Xe as radiator and the advantages of using Sn instead. It will be demonstrated that the spectral efficiency of Sn is a factor of 3 higher than Xe.

Paper Details

Date Published: 16 June 2003
PDF: 7 pages
Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); doi: 10.1117/12.483611
Show Author Affiliations
Joseph Pankert, Philips Extreme UV GmbH (Germany)
Klaus Bergmann, Fraunhofer-Institut fuer Lasertechnik (Germany)
Juergen Klein, Fraunhofer-Institut fuer Lasertechnik (Germany)
Willi Neff, Fraunhofer-Institut fuer Lasertechnik (Germany)
Oliver Rosier, Fraunhofer-Institut fuer Lasertechnik (Germany)
Stefan Seiwert, Fraunhofer-Institut fuer Lasertechnik (Germany)
Christopher Smith, Fraunhofer-Institut fuer Lasertechnik (Germany)
Sven Probst, Fraunhofer-Institut fuer Lasertechnik (Germany)
Dominik Vaudrevange, Philips Extreme UV GmbH (Germany)
Guido Siemons, Philips Extreme UV GmbH (Germany)
Rolf Apetz, Philips Extreme UV GmbH (Germany)
Jeroen Jonkers, Philips Extreme UV GmbH (Germany)
Michael Loeken, Philips Extreme UV GmbH (Germany)
Eric Bosch, Philips Research Labs. (Germany)
Guenther H. Derra, Philips Research Labs. (Germany)
Thomas Kruecken, Philips Research Labs. (Germany)
Peter Zink, Philips Research Labs. (Germany)


Published in SPIE Proceedings Vol. 5037:
Emerging Lithographic Technologies VII
Roxann L. Engelstad, Editor(s)

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