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Proceedings Paper

Maskless lithography: a low-energy electron-beam direct writing system with a common CP aperture, and recent progress
Author(s): Tetsuro Nakasugi; Atsushi Ando; Ryoichi Inanami; Noriaki Sasaki; Takumi Ota; Osamu Nagano; Yuuichiro Yamazaki; Kazuyoshi Sugihara; Ichiro Mori; Motosuke Miyoshi; Katsuya Okumura; Akira Miura
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Paper Abstract

In order to realize SoC (System on a Chip) fabrication at low cost with quick-TAT (Turn-Around-Time) we have proposed a maskless lithography (ML2) strategy, a low-energy electron-beam direct writing (LEEBDW) system with a common character projection (CP) aperture. This paper presents a status report on our proof-of-concept (POC) system. We have developed a compact EB column consisting small electrostatic lenses and deflectors. The experimental results for our POC system indicated that the patterns corresponding to 50nm-node logic devices can be obtained with CP exposure at the incident energy of 5 keV. The technique to reduce the raw process time using a SEM function of LEEBDW system is also reported.

Paper Details

Date Published: 16 June 2003
PDF: 8 pages
Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); doi: 10.1117/12.483607
Show Author Affiliations
Tetsuro Nakasugi, Toshiba Corp. (Japan)
Atsushi Ando, Toshiba Corp. (Japan)
Ryoichi Inanami, Toshiba Corp. (Japan)
Noriaki Sasaki, Toshiba Corp. (Japan)
Takumi Ota, Toshiba Corp. (Japan)
Osamu Nagano, Toshiba Corp. (Japan)
Yuuichiro Yamazaki, Toshiba Corp. (Japan)
Kazuyoshi Sugihara, Toshiba Corp. (Japan)
Ichiro Mori, Toshiba Corp. (Japan)
Motosuke Miyoshi, Univ. of Tokyo (Japan)
Katsuya Okumura, Univ. of Tokyo (Japan)
Akira Miura, e-BEAM Corp. (Japan)

Published in SPIE Proceedings Vol. 5037:
Emerging Lithographic Technologies VII
Roxann L. Engelstad, Editor(s)

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