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Proceedings Paper

Demonstration of imaging interferometric microscopy (IIM)
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Paper Abstract

We demonstrate imaging interferometric microscopy (IIM) for binary objects in two dimensions. Combining multiple exposures with different off-axis illumination configurations together with interferometric restoration of the zero-order beam during dark-field conditions, IIM provides high lateral resolution at low numerical apertures (NA). It retains the large field-of-view, long working distance and large depth-of-field of a low-NA imaging system. Also we include a first demonstration of imaging of a phase mask. All these properties are increasingly important for in semiconductor mask metrology. IIM relies on image processing to reconstruct the image; we present the processes necessary to obtain the combined image. Finally we compare the experiment with a simple Fourier optics model.

Paper Details

Date Published: 2 June 2003
PDF: 11 pages
Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); doi: 10.1117/12.483429
Show Author Affiliations
Christian J. Schwarz, Univ. of New Mexico (United States)
Yuliya Kuznetsova, Univ. of New Mexico (United States)
Steven R. J. Brueck, Univ. of New Mexico (United States)


Published in SPIE Proceedings Vol. 5038:
Metrology, Inspection, and Process Control for Microlithography XVII
Daniel J. Herr, Editor(s)

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