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Proceedings Paper

Subwavelength antireflection structure for optical detector fabricated by fast atom beam etching
Author(s): Yoshiaki Kanamori; Masahiro Ishimori; Kazuhiro Hane
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Paper Details

Date Published: 10 September 2002
PDF: 8 pages
Proc. SPIE 4928, MEMS/MOEMS Technologies and Applications, (10 September 2002); doi: 10.1117/12.483186
Show Author Affiliations
Yoshiaki Kanamori, Tohoku Univ. (Japan)
Masahiro Ishimori, Tohoku Univ. (Japan)
Kazuhiro Hane, Tohoku Univ. (Japan)

Published in SPIE Proceedings Vol. 4928:
MEMS/MOEMS Technologies and Applications
Guofan Jin; John S. McKillop; Kazuhiro Hane, Editor(s)

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