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Proceedings Paper

Smooth diamond films by reactive ion-beam polishing
Author(s): Bertrand G. Bovard; Tianji Zhao; H. Angus Macleod
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Paper Abstract

Recent progress in ion beam polishing has successfully led to the production of smooth diamond films. By means of an oxygen ion beam, a 5 cm diameter, 1 micrometers rough film grown by microwave plasma chemical vapor deposition on silicon has been polished. The polished film root-mean-square and peak-to-valley roughness values averaged over 15 points are respectively 5.5 nm and 55.4 nm. Scattering has been decreased to the point where the polished film is transparent at wavelengths above the silicon absorption edge and shows interference fringes. This suggests that diamond films polished by this process can be used in optical applications. This paper describes the polishing technique and presents the results obtained by surface profilometry of the polished sample. The main advantages of ion beam polishing over other existing methods lie in the fact that it is noncontact and low-temperature technique.

Paper Details

Date Published: 1 December 1991
PDF: 7 pages
Proc. SPIE 1534, Diamond Optics IV, (1 December 1991); doi: 10.1117/12.48295
Show Author Affiliations
Bertrand G. Bovard, Optical Sciences Ctr./Univ. of Arizona (United States)
Tianji Zhao, Optical Sciences Ctr./Univ. of Arizona (United States)
H. Angus Macleod, Optical Sciences Ctr./Univ. of Arizona (United States)


Published in SPIE Proceedings Vol. 1534:
Diamond Optics IV
Albert Feldman; Sandor Holly, Editor(s)

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