Proceedings PaperNew diamond activities at Osaka University
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The activities for diamond film by so-called 'magneto-active low pressure plasma CVD' with film characteristics were started in 1987. The motivation has been to establish the fabrication of high-quality and wide-area diamond films at low deposition temperature. How and why the low pressure (0.1 ~ 0.001Torr) plasma which is 3 or 4 order of magnitude lower than conventional plasma CVD can be used for diamond films with deposition rate of about 1 micrometers /hr are examined. How and why the starting gases have been changed from the conventional CH4 + H2 to CH4 + CO + CO2 + H2 and also CH2 (OH) + He (no H2) are discussed. How successfully the double- probe method has been applied to characterize the low pressure plasma for the first time is presented. How the SENTAXY diamond films composed of very high quality diamond particles have been improved is considered. The paper also discusses how detailed the Cathode Luminescence (CL) method has been applied for the characterization of diamond films and the analysis of the impurity and radiation induced color centers in the films, and how other characterization techniques such as XPS, RBS have been applied for the first time to investigate the CVD diamond films.