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Proceedings Paper

Maskless patterning characteristics of vanadium pentoxide amorphous films by frequency-doubled Q-seitched Nd:YAG laser irradiation
Author(s): Moriaki Wakaki; Ryuzaburo Nakao; Hironobu Sakata; Takehisa Shibuya; Akira Yoshikado
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Paper Abstract

Patterning of vanadium pentoxide (V2O5) visible light absorbing amorphous films was attempted using a SHG beam (λ =532nm) of Q-switched Nd:YAG laser. Amorphous V2O5 films (350nm thick) were deposited on an optical glass slide substrate 1.4mm thick by normal resistance-heating vacuum evaporation. A sheet beam of the pulse laser with an output power of 1.4J/pulse was used, having a pulse width of 10ns, and a calculated laser fluence of 46.1J/cm2. The beam with pulse repetition of 10Hz was irradiated in air at room-temperature on the film sample that moved to the direction normal to that of the sheet beam with a speed of 5mm/s. Both direct and indirect beam irradiation through the glass substrate produced a regular stripe pattern due to film removal. Characterization of removed and non-removed film portions in a laser track reveals a molecular and/or nanocluster sublimation of amorphous V2O5 caused by laser irradiation. This patterning has an advantage of short-time film processing.

Paper Details

Date Published: 12 September 2002
PDF: 9 pages
Proc. SPIE 4915, Lasers in Material Processing and Manufacturing, (12 September 2002); doi: 10.1117/12.482906
Show Author Affiliations
Moriaki Wakaki, Tokai Univ. (Japan)
Ryuzaburo Nakao, Tokai Univ. (Japan)
Hironobu Sakata, Tokai Univ. (Japan)
Takehisa Shibuya, Tokai Univ. (Japan)
Akira Yoshikado, Tokyo Precision Parts Mfg. Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 4915:
Lasers in Material Processing and Manufacturing
ShuShen Deng; Tatsuo Okada; Klaus Behler; XingZong Wang, Editor(s)

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