Share Email Print

Proceedings Paper

New mixed sputtering-plasma CVD technique for the deposition of diamondlike films
Author(s): Francesca Demichelis; G. Giachello; C. F. Pirri; Alberto Tagliaferro
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The purpose of this work is to show that diamond-like carbon (DLC) films of good quality can be deposited by sputtering of a graphite target in an argon-hydrogen atmosphere. The details of the RF diode sputtering system are described. The main features of the deposition process, such as the detection of CH radicals in the plasma, are presented. The advantages of this system are discussed. For example, it joins the easy-to-scale characteristics of the glow discharge process with the independent control of carbon and hydrogen sources found in dual ion beam sputtering. The DLC character of the films are checked measuring the Knupp hardness and the optical energy gap.

Paper Details

Date Published: 1 December 1991
PDF: 8 pages
Proc. SPIE 1534, Diamond Optics IV, (1 December 1991); doi: 10.1117/12.48286
Show Author Affiliations
Francesca Demichelis, Politecnico di Torino (Italy)
G. Giachello, Politecnico di Torino (Italy)
C. F. Pirri, Politecnico di Torino (Italy)
Alberto Tagliaferro, Politecnico di Torino (Italy)

Published in SPIE Proceedings Vol. 1534:
Diamond Optics IV
Albert Feldman; Sandor Holly, Editor(s)

© SPIE. Terms of Use
Back to Top