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Proceedings Paper

A classifier design method based on the invariance properties of the Bhattacharyya distance functional
Author(s): Emerson Prado Lopes
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Paper Abstract

The Bhattacharyya distance functional invariance classifier design method (BDFICDM) reaches an excellent tradeoff between the accuracy performance of nearly 100% and the time performance as much as there is available computational resources for parallelism. A serial implementation of the method is applied to an image composed of two synthetic and two Bradatz textures preserving its characteristics of being highly suitable to a parallel implementation. This implementation characterizes the pattern by composing independent cells of magnitudes evaluated through the interaction of spatially distributed elementary piece of information (EPI) using the Bhatacharyya distance similarity measure. The localized representation, EPI is composed of shifted frames sampled by a sequential process over a direction in order to preserve the pattern topological information. The representational extension of the functional pattern representation is its reduction focusing only on those EPI best candidates for generating invariance locations and using the graph structures for their representation. The BDF sample is classified within a Bayesian approach by comparing it to only those reduced pattern states of invariance, decreasing abruptly the number of needed interactions and comparisons. The procedure comprises the multiple frame, resolution, hypothesis and class approaches and the image representation used as input in the training and classification processes at the frame decomposition instance, is reduced through the use of the KL transform.

Paper Details

Date Published: 1 August 2003
PDF: 12 pages
Proc. SPIE 5049, Smart Structures and Materials 2003: Modeling, Signal Processing, and Control, (1 August 2003); doi: 10.1117/12.482846
Show Author Affiliations
Emerson Prado Lopes, Federal Univ. of Rio de Janeiro (Brazil)

Published in SPIE Proceedings Vol. 5049:
Smart Structures and Materials 2003: Modeling, Signal Processing, and Control
Ralph C. Smith, Editor(s)

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