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Proceedings Paper

Quantifying drift in SEM
Author(s): Albert Sicignano; Dmitriy Y. Yeremin; Matthew Sandy; E. Tim Goldburt
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Paper Abstract

A novel approach for determining the drift behavior of an SEM with high precision in 2D space is presented. David Joy described an indirect proceudre for qualitatively detecting image drift in the time domain using FFTs of sequential images. SEM metrology is based on first acquiring an image representation of an object. In this paper, we present a direct approach for quantifying SEM image drift. The next step is applying various algorithms which attempt to determine feature boundaries. The above sequence is based on a stable SEM performance during teh image acquisition interval. If movement of the feature within the imaged field occurs during the acquisition interval, a distorted stability is a critical precursor for precision SEM metrology. We will describe a novel approach for quantifying SEM drift with a precision greeater than 0.2nm within an image field.

Paper Details

Date Published: 2 June 2003
PDF: 9 pages
Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); doi: 10.1117/12.482833
Show Author Affiliations
Albert Sicignano, Nanometrology LLC (United States)
Dmitriy Y. Yeremin, Nanometrology LLC (United States)
Matthew Sandy, Nanometrology LLC (United States)
E. Tim Goldburt, Nanometrology LLC (United States)

Published in SPIE Proceedings Vol. 5038:
Metrology, Inspection, and Process Control for Microlithography XVII
Daniel J. Herr, Editor(s)

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