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Proceedings Paper

System and process learning in a full-field high-power EUVL alpha tool
Author(s): William P. Ballard; Daniel A. Tichenor; Donna J. O'Connell; Luis J. Bernardez; Robert E. Lafon; Richard J. M. Anderson; Alvin H. Leung; Kenneth A. Williams; Steven J. Haney; Yon E. Perras; Karen L. Jefferson; Therese L. Porter; Daniel Knight; Pamela K. Barr; James L. Van de Vreugde; Richard H. Campiotti; Mark D. Zimmerman; Terry A. Johnson; Leonard E. Klebanoff; Philip A. Grunow; Samuel Graham; Dean A. Buchenauer; William C. Replogle; Tony G. Smith; John B. Wronosky; Joel R. Darnold; Kenneth L. Blaedel; Henry N. Chapman; John S. Taylor; Layton C. Hale; Gary E. Sommargren; Eric M. Gullikson; Patrick P. Naulleau; Kenneth A. Goldberg; Sang Hun Lee; Harry Shields; Randall J. St. Pierre; Samuel Ponti
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Paper Abstract

Full-field imaging with a developmental projection optic box (POB 1) was successfully demonstrated in the alpha tool Engineering Test Stand (ETS) last year. Since then, numerous improvements, including laser power for the laser-produced plasma (LPP) source, stages, sensors, and control system have been made. The LPP has been upgraded from the 40 W LPP cluster jet source used for initial demonstration of full-field imaging to a high-power (1500 W) LPP source with a liquid Xe spray jet. Scanned lithography at various laser drive powers of >500 W has been demonstrated with virtually identical lithographic performance.

Paper Details

Date Published: 16 June 2003
PDF: 11 pages
Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); doi: 10.1117/12.482791
Show Author Affiliations
William P. Ballard, Sandia National Labs. (United States)
Daniel A. Tichenor, Sandia National Labs. (United States)
Donna J. O'Connell, Sandia National Labs. (United States)
Luis J. Bernardez, Sandia National Labs. (United States)
Robert E. Lafon, W. M. Keck Observatory (United States)
Richard J. M. Anderson, Sandia National Labs. (United States)
Alvin H. Leung, Sandia National Labs. (United States)
Kenneth A. Williams, Sandia National Labs. (United States)
Steven J. Haney, Sandia National Labs. (United States)
Yon E. Perras, Sandia National Labs. (United States)
Karen L. Jefferson, Sandia National Labs. (United States)
Therese L. Porter, Sandia National Labs. (United States)
Daniel Knight, Sandia National Labs. (United States)
Pamela K. Barr, Sandia National Labs. (United States)
James L. Van de Vreugde, Sandia National Labs. (United States)
Richard H. Campiotti, Sandia National Labs. (United States)
Mark D. Zimmerman, Sandia National Labs. (United States)
Terry A. Johnson, Sandia National Labs. (United States)
Leonard E. Klebanoff, Sandia National Labs. (United States)
Philip A. Grunow, Sandia National Labs. (United States)
Samuel Graham, Sandia National Labs. (United States)
Dean A. Buchenauer, Sandia National Labs. (United States)
William C. Replogle, Sandia National Labs. (United States)
Tony G. Smith, Sandia National Labs. (United States)
John B. Wronosky, Sandia National Labs. (United States)
Joel R. Darnold, Sandia National Labs. (United States)
Kenneth L. Blaedel, Lawrence Berkeley National Lab. (United States)
Henry N. Chapman, Lawrence Berkeley National Lab. (United States)
John S. Taylor, Lawrence Berkeley National Lab. (United States)
Layton C. Hale, Lawrence Berkeley National Lab. (United States)
Gary E. Sommargren, Lawrence Berkeley National Lab. (United States)
Eric M. Gullikson, Lawrence Livermore National Lab. (United States)
Patrick P. Naulleau, Lawrence Livermore National Lab. (United States)
Kenneth A. Goldberg, Lawrence Livermore National Lab. (United States)
Sang Hun Lee, Intel Corp. (United States)
Harry Shields, TRW, Inc. (United States)
Randall J. St. Pierre, Cutting Edge Optronics, Inc. (United States)
Samuel Ponti, Cutting Edge Optronics, Inc. (United States)


Published in SPIE Proceedings Vol. 5037:
Emerging Lithographic Technologies VII
Roxann L. Engelstad, Editor(s)

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