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Proceedings Paper

Measurement of the dielectric function spectra of low dielectric constant using spectroscopic ellipsometry
Author(s): Masahiro Horie; Kamil Postava; Tomuo Yamaguchi; Kumiko Akashika; Hideki Hayashi; Fujikazu Kitamura
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Paper Abstract

The dielectric function spectra of low dielectric constants (low-k) materials have been determined using spectroscopic ellipsometry, normal incidence spectroscopic reflectometry, and Fourier transform infrared transmission spectrometry over a wide spectral range from 0.03 to 5.4 eV (230nm to 40.5um wavelength region). The electric and ionic contributions to the overall static dielectric constants were determined for representative materials used in the semiconductor industry for interlayer dielectrics: (1) FLARE - organic spin-on polymer, (2) HOSP - spin-on hybrid organic-siloxane polymer from the Honeywell Electric Materials Company, and (3) SiLK- organic dielectric resin from the Dow Chemical Company. The main contributions to the static dielectric constant of the low-k materials studied were found to be the electric and ionic absorption.

Paper Details

Date Published: 2 June 2003
PDF: 7 pages
Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); doi: 10.1117/12.482678
Show Author Affiliations
Masahiro Horie, Dainippon Screen Manufacturing Co., Ltd. (Japan)
Kamil Postava, Technical Univ. of Ostrava (Czech Republic)
Tomuo Yamaguchi, Shizuoka Univ. (Japan)
Kumiko Akashika, Dainippon Screen Manufacturing Co., Ltd. (Japan)
Hideki Hayashi, Dainippon Screen Manufacturing Co., Ltd. (Japan)
Fujikazu Kitamura, Dainippon Screen Manufacturing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 5038:
Metrology, Inspection, and Process Control for Microlithography XVII
Daniel J. Herr, Editor(s)

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