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Proceedings Paper

Characterization of a laser-produced plasma source for a laboratory EUV reflectometer
Author(s): Frank Scholze; Frank Scholz; Johannes Tuemmler; Gerhard Ulm; Herbert Legall; Peter-Viktor Nickles; Wolfgang Sandner; Holger Stiel; Ludwig van Loyen
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Paper Abstract

With the development of EUV lithography there is an increasing need for high-accuracy at-wavelength metrology. In particular, there is an urgent need for metrology at optical components like mirrors or masks close to the production line. Sources for metrology have to fit different demands on EUV power and spectral shape than sources for steppers systems. We present the results of the radiometric characterization of a laser produced plasma (LPP)-source, newly developed at Max-Born-Institute Berlin for use in an EUV reflectometer. It is operated with a high-power pointing-stabilized laser beam (energy per pulse up to 700 mJ, 10 ns pulse duration, < ± 25 μrad pointing stability) at 532 nm which is focussed on a rotating Au target cylinder. The incident angle of the laser beam is set to 63°, the detecting angle 55° to the target normal. The source has been characterized regarding spectral photon flux, source size and source point stability. Two independently calibrated instruments, an imaging spectrometer and a double multilayer tool for in-band power measurements were used to obtain highly reliable quantitative values for the EUV emission of the Au-LPP source. Both instruments were calibrated by Physikalisch-Technische Bundesanstalt in its radiometry laboratory at the electron storage ring BESSY II. We obtained a source size of 30 μm by 50 μm (2s horizontal by vertical) and a stability of better than 2s=5 μm horizontally and 2s=9 μm vertically. A spectral photon flux of 1*10e14 /(s sr 0.1 nm) at 13.4 nm at a laser pulse energy of 630 mJ is obtained. The shot-to-shot stability of the source is about 5% (1s) for laser pulse energies above 200 mJ. For pulse energies between 200 mJ and 700 mJ, there is a linear relation between laser pulse energy and EUV output. The spectrum shows a flat continuos emission in the EUV spectral range, which is important for wavelength scanning reflectometry. High stability in total flux and spectral shape of the plasma emission as well as low debris was only obtained using a new target position for each shot. There is also a trade off between source size and EUV power. For a slightly defocused laser, an increase in EUV power up to a factor of two is obtained, while the source size also increases by about a factor of two. It is shown that an Au-LPP source provides spectrally flat reproducible emission with sufficient power at low debris conditions for the operation of a laboratory based EUV reflectometer.

Paper Details

Date Published: 16 June 2003
PDF: 12 pages
Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); doi: 10.1117/12.482646
Show Author Affiliations
Frank Scholze, Physikalisch-Technische Bundesanstalt (Germany)
Frank Scholz, Physikalisch-Technische Bundesanstalt (Germany)
Johannes Tuemmler, Physikalisch-Technische Bundesanstalt (Germany)
Gerhard Ulm, Physikalisch-Technische Bundesanstalt (Germany)
Herbert Legall, Max-Born-Institut (Germany)
Peter-Viktor Nickles, Max-Born-Institut (Germany)
Wolfgang Sandner, Max-Born-Institut (Germany)
Holger Stiel, Max-Born-Institut (Germany)
Ludwig van Loyen, Fraunhofer-Institut fuer Werkstoff- und Strahltechnik (Germany)


Published in SPIE Proceedings Vol. 5037:
Emerging Lithographic Technologies VII
Roxann L. Engelstad, Editor(s)

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