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Proceedings Paper

Protecting reticles from contamination using SMIF technologies
Author(s): Sheng-Bai Zhu
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Paper Abstract

This paper discusses potential sources of contaminants, their impacts on lithography processes, and the possibility of solving such problems using SMIF technologies. Theoretical models are developed and experimental data are presented.

Paper Details

Date Published: 2 June 2003
PDF: 7 pages
Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); doi: 10.1117/12.482642
Show Author Affiliations
Sheng-Bai Zhu, Asyst Technologies, Inc. (United States)


Published in SPIE Proceedings Vol. 5038:
Metrology, Inspection, and Process Control for Microlithography XVII
Daniel J. Herr, Editor(s)

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