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Proceedings Paper

Printability of opaque and clear phase defects using the finite-difference time-domain (FDTD) method
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Paper Abstract

The defect printability for two types of patterns isolated lines and contact holes was studied through a finite-difference time-domain (FDTD) computer simulation approach at the EUV wavelength of 13.5 nm. A three-dimensional FDTD solver was employed for aerial image analysis to assess the overall acceptable defect size for both opaque as well as clear phase defects for the 32 nm technology node.

Paper Details

Date Published: 16 June 2003
PDF: 10 pages
Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); doi: 10.1117/12.482640
Show Author Affiliations
Christof G. Krautschik, Association of Super-Advanced Electronics Technologies (Japan)
Iwao Nishiyama, Association of Super-Advanced Electronics Technologies (Japan)


Published in SPIE Proceedings Vol. 5037:
Emerging Lithographic Technologies VII
Roxann L. Engelstad, Editor(s)

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