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Proceedings Paper

Characterization of failure mechanisms for oxide VCSELs
Author(s): Scott A. McHugo; A. Krishnan; Joachim J. Krueger; Yong Luo; Ningxia Tan; Tim Osentowski; Suning Xie; Myrna S. Mayonte; Robert W. Herrick; Qing Deng; Mike Heidecker; David Eastley; Mark R. Keever; Christophe P. Kocot
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Paper Abstract

Oxide VCSELs are the emitter of choice for high-speed optical communication applications. A low divergence circular beam, wafer-level testing and the capability to create dense two-dimensional arrays provide the VCSEL with unique advantages over edge emitting lasers, such that VSCELs have become a significant part of the optical communication market. An equally important metric for VCSELs is field reliability since significant failure rates are unacceptable for implementation of reliable networks. In order to better understand potential failure paths of VCSELs during field use, a variety of failures have been intentionally created on oxide VCSELs made from AlGaAs / GaAs materials operating at 850nm. Failures were created with epitaxial defects, scratches, surface contamination, thermal shock , ESD and elevated temperature and humidity (85C/85% humidity). We will present the results of these intentional failures, assess high-probability failure paths and compare and contrast the various failure mechanisms.

Paper Details

Date Published: 17 June 2003
PDF: 12 pages
Proc. SPIE 4994, Vertical-Cavity Surface-Emitting Lasers VII, (17 June 2003); doi: 10.1117/12.482637
Show Author Affiliations
Scott A. McHugo, Agilent Technologies (United States)
A. Krishnan, Agilent Technologies (United States)
Joachim J. Krueger, Agilent Technologies (United States)
Yong Luo, Agilent Technologies (United States)
Ningxia Tan, Agilent Technologies (United States)
Tim Osentowski, Agilent Technologies (United States)
Suning Xie, Agilent Technologies (United States)
Myrna S. Mayonte, Agilent Technologies (United States)
Robert W. Herrick, Agilent Technologies (United States)
Qing Deng, Agilent Technologies (United States)
Mike Heidecker, Agilent Technologies (United States)
David Eastley, Agilent Technologies (United States)
Mark R. Keever, Agilent Technologies (United States)
Christophe P. Kocot, Agilent Technologies (United States)


Published in SPIE Proceedings Vol. 4994:
Vertical-Cavity Surface-Emitting Lasers VII
Chun Lei; Sean P. Kilcoyne, Editor(s)

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