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Proceedings Paper

PREUVE and the EXULITE project: modular laser-produced plasma EUV source
Author(s): Tiberio Ceccotti; F. Chichmanian; D. Descamps; P. Haltebourg; Jean-Francois Hergott; S. Hulin; Didier Normand; Marc Segers; Olivier Sublemontier; Martin Schmidt; Philippe Cormont; M. Neu; Pierre-Yves Thro; Jean-Marc Weulersse; B. Barthod; R. Bernard; E. Veran; Jean-Marie Barbiche; Ph. D'Aux; E. Marquis
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Paper Abstract

Within the PREUVE project, the GAP of CEA Saclay has developed an EUV source that should meet (alpha) -tool specifications by the end of this year. In particular, a laser-produced plasma source has been developed that uses a dense and confined xenon jet target. Our technical solution is based on a specific target injector design and the use of well adapted nozzle materials to avoid debris formation by plasma erosion. After injection, the xenon is recycled and highly purified to reach a low cost round- the-clock operation. This source provides both high conversion efficiency and low debris flux. These are necessary conditions for its industrial application in the future EUV microlithography. The conception of the so-called ELSA (EUV Lithography Source Apparatus) prototype allows in principal 2 years full operation on the French lithography test bench BEL (Banc d'essai pour la lithographie) that has been developed during PREUVE. In parallel, the EXULITE consortium that is coordinated by Alcatel Vacuum Technology France (AVTF) has started its activities in the frame of the European MEDEA+ initiative on EUV source development. In collaboration with Thales and the CEA, AVTF develops a prototype power source for EUV lithography production tools by the end of 2004. A low cost and modular high power laser system architecture has been chosen and is developed by Thales and the CEA to pump the laser plasma- produced EUV source.

Paper Details

Date Published: 13 September 2002
PDF: 7 pages
Proc. SPIE 4760, High-Power Laser Ablation IV, (13 September 2002); doi: 10.1117/12.482115
Show Author Affiliations
Tiberio Ceccotti, CEA Saclay (France)
F. Chichmanian, CEA Saclay (France)
D. Descamps, CEA Saclay (France)
P. Haltebourg, CEA Saclay (France)
Jean-Francois Hergott, CEA Saclay (France)
S. Hulin, CEA Saclay (France)
Didier Normand, CEA Saclay (France)
Marc Segers, CEA Saclay (France)
Olivier Sublemontier, CEA Saclay (France)
Martin Schmidt, CEA Saclay (France)
Philippe Cormont, CEA Saclay (France)
M. Neu, CEA Saclay (France)
Pierre-Yves Thro, CEA Saclay (France)
Jean-Marc Weulersse, CEA Saclay (France)
B. Barthod, Alcatel Vacuum Technology France (France)
R. Bernard, Alcatel Vacuum Technology France (France)
E. Veran, Alcatel Vacuum Technology France (France)
Jean-Marie Barbiche, Thales Laser (France)
Ph. D'Aux, Thales Laser (France)
E. Marquis, Thales Laser (France)

Published in SPIE Proceedings Vol. 4760:
High-Power Laser Ablation IV
Claude R. Phipps, Editor(s)

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